Publisher's Synopsis
This volume presents a research update of silicon and non-silicon transient processing techniques, such as rapid thermal process, laser processes, flash evaporation and jet processes. It also covers process sensors, equipment issues and the manufacturer's perspective.;Coverage includes: modelling, measurement and control of rapid thermal processing, rapid thermal annealing, issues in silicon processing, transient thermal processing in III-V semiconductor technology, multi-wavelength imaging pyrometer for non-contact temperature monitoring, real-time implementation of an adaptive control system for a three-zone RTP state.