Paperback (30 Jun 2020)
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This book focusses on the spacer engineering aspects of novel MOS-based device-circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
| ISBN: | 9780367573553 |
| Publisher: | CRC Press |
| Imprint: | CRC Press |
| Pub date: | 30 Jun 2020 |
| DEWEY: | 621.3815284 |
| DEWEY edition: | 23 |
| Language: | English |
| Number of pages: | 138 |
| Weight: | 453g |
| Height: | 234mm |
| Width: | 156mm |
| Spine width: | 13mm |
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