Resists in Microlithography and Printing

Photoresists, electron and X-ray resists are generally mixtures based on organic polymers and radiation sensitive materials. Research and development of these mixtures is complicated and may be solved only in mutual collaboration between organic and physical chemistry, polymer chemistry, high energy and semiconductor chemistry and physics, as well as other branches of science. Research projects concerning the development, fabrication and application of resists necessitate systematic basic and applied research, increased effort on the part of research workers, and especially critical evaluation of the facts known to date and experimental results. All this has been borne in mind in the writing of this volume, the aim of which is to summarize and evaluate recent results of resist investigation and applications. Special attention is given to processes influencing the properties and quality of off-set plates, such as types of substrates and their coating, exposure, development, adhesion to substrate, hydrophobicity, etc.