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Proceedings of the Fifth International Symposium of Process Physics and Modeling in Semiconductor Technology

Proceedings of the Fifth International Symposium of Process Physics and Modeling in Semiconductor Technology - Proceedings

Book (01 Jan 1999)

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Publisher's Synopsis

Contains papers from a May 1999 symposium, addressing topics in understanding and modeling of ion implantation and damage annealing, diffusion, segregation and aggregation of dopants and point defects, and back-end processing. Papers on ion implantation consider both fundamental and computationally

Book information

ISBN: 9781566772242
Publisher: Electrochemical Society
Imprint: Electrochemical Society
Pub date:
DEWEY: 621.38152
DEWEY edition: 21
Language: English
Number of pages: 229
Weight: 566g
Height: 234mm
Width: 158mm
Spine width: 12mm