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Plasma Sources for Thin Film Deposition and Etching

Plasma Sources for Thin Film Deposition and Etching - Physics of Thin Films

Hardback (01 Aug 1994)

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Publisher's Synopsis

This latest volume of the well-known Physics of Thin Films Series includes four chapters that discuss high-density plasma sources for materials processing, electron cyclotron resonance and its uses, unbalancedmagnetron sputtering, and particle formation in thin film processing plasma.

Book information

ISBN: 9780125330183
Publisher: Elsevier Science
Imprint: Academic Press
Pub date:
Language: English
Number of pages: 328
Weight: 642g
Height: 158mm
Width: 236mm
Spine width: 27mm