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Photomask and X-Ray Mask Technology IV

Photomask and X-Ray Mask Technology IV 17-18 April, 1997, Kawasaki, Japan - Proceedings / SPIE--the International Society for Optical Engineering

Paperback (28 Jul 1997)

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Book information

ISBN: 9780819425164
Publisher: SPIE
Imprint: SPIE
Pub date:
DEWEY: 621.381531
DEWEY edition: 21
Language: English
Number of pages: 504
Weight: -1g