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Photomask and Next-Generation Lithography Mask Technology XII

Photomask and Next-Generation Lithography Mask Technology XII 13-15 April, 2005, Yokohama, Japan - Proceedings of SPIE

Paperback (30 Jun 2005)

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Publisher's Synopsis

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Book information

ISBN: 9780819458537
Publisher: SPIE
Imprint: SPIE
Pub date:
DEWEY: 621.381531
DEWEY edition: 22
Language: English
Number of pages: 1048
Weight: -1g