Biometrics
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Published 20 Nov 2018
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Photomask and Next-Generation Lithography Mask Technology VIII 25-27 April 2001, Yokohama, Japan - SPIE Proceedings Series
Book (01 Jan 2001)
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Book information
| ISBN: | 9780819441119 |
| Publisher: | SPIE |
| Imprint: | SPIE |
| Pub date: | 01 Jan 2001 |
| DEWEY: | 621.381531 |
| DEWEY edition: | 21 |
| Language: | English |
| Number of pages: | 738 |
| Weight: | -1g |
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