Paperback (31 Jul 2002)
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Out of stock
This text examines photomask and next-generation lithography mask technology.
| ISBN: | 9780819445179 |
| Publisher: | SPIE |
| Imprint: | SPIE |
| Pub date: | 31 Jul 2002 |
| DEWEY: | 621.381531 |
| DEWEY edition: | 22 |
| Language: | English |
| Number of pages: | 918 |
| Weight: | -1g |
| Height: | 230mm |
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