Hardback (25 Jun 1998)
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"Explores the science and technology of lithographic processes and resist materials and summarizes the most recent innovations in semiconductor manufacturing. Considers future trends in lithography and resist material technology. Reviews the interaction of light, electron beams, and X-rays with resist materials."
| ISBN: | 9780824799519 |
| Publisher: | CRC Press |
| Imprint: | CRC Press |
| Pub date: | 25 Jun 1998 |
| DEWEY: | 621.38152 |
| DEWEY edition: | 21 |
| Language: | English |
| Number of pages: | 327 |
| Weight: | 612g |
| Height: | 279mm |
| Width: | 216mm |
| Spine width: | 22mm |
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