Publisher's Synopsis
Use of polymers is widespread in the electronics industry, both in manufacturing integrated circuits and as components in the completed devices. In addition to providing an update in conventional microlithography technology, this book describes new patterning techniques involving block copolymers, direct deposition of metal oxides and other materials, and image-wise chemical deposition.;It illustrates the challenges and opportunities in designing ArF excimer laser resists in the next generation of lithographic technology.;Also included are discussions of material design alternatives, acid generator chemistries, and acid diffusion mechanisms in chemically amplified resists, which have now replaced novolac/diazoquinone resists in device manufacturing. Providing insights into breakthroughs in nano-technology, this book is designed to be an important step in the development of integrated circuits.;This book is intended for graduate level polymer scientists in the microelectronics industry.
