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Metrology, Inspection, and Process Control for Microlithography XXII

Metrology, Inspection, and Process Control for Microlithography XXII 25-28 February 2008, San Jose, California, USA - Proceedings of SPIE

Paperback (30 Aug 2008)

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Publisher's Synopsis

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Book information

ISBN: 9780819471079
Publisher: SPIE
Imprint: SPIE
Pub date:
DEWEY: 621.381531
DEWEY edition: 23
Language: English
Weight: -1g