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Metrology, Inspection, and Process Control for Microlithography XX

Metrology, Inspection, and Process Control for Microlithography XX 20-23 February, 2006, San Jose, California, USA - Proceedings of SPIE

Paperback (30 Jan 2008)

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    Publisher's Synopsis

    Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

    Book information

    ISBN: 9780819461957
    Publisher: SPIE
    Imprint: SPIE
    Pub date:
    DEWEY: 621.38153
    DEWEY edition: 22
    Language: English
    Weight: -1g

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