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Metrology, Inspection, and Process Control for Microlithography XIX

Metrology, Inspection, and Process Control for Microlithography XIX 28 February-3 March, 2005, San Jose, California, USA - SPIE Proceedings Series

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Publisher's Synopsis

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Book information

ISBN: 9780819457325
Publisher: SPIE
Imprint: SPIE
Pub date:
Language: English
Number of pages: 1474
Weight: 1306g
Height: 266mm
Width: 209mm
Spine width: 25mm