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Ion Source Cleaning in Semiconductor Processing Systems

Ion Source Cleaning in Semiconductor Processing Systems United States Patent 9991095

Paperback (30 Nov 2020)

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Publisher's Synopsis

Cleaning of an ion implantation system or components thereof, utilizing temperature and/or a reactive cleaning reagent enabling growth/etching of the cathode in an indirectly heated cathode for an ion implantation system by monitoring the cathode bias power and taking corrective action depending upon compared values to etch or regrow the cathode.

Book information

ISBN: 9798573120812
Publisher: Independently Published
Imprint: Independently Published
Pub date:
Language: English
Number of pages: 26
Weight: 86g
Height: 280mm
Width: 216mm
Spine width: 1mm