Publisher's Synopsis
Methods of producing thin-film structures are discussed. Special attention is given to liquid-phase epitaxy from a limited melt bulk with and without application of an electric field. A method is described which combines liquid-phase and diffusion techniques for obtaining structures with a specific configuration of waveguide channels. The physico-chemical properties of thin ferroelectric layers, such as morphology, the domain structure of the transition layer and ferroelectric properties are examined. Important role in applying electro-optic modulators, deflectors and transducers is played by optical properties, mode composition of propagating radiation, second harmonic generation, electro-optic properties, photorefraction, destruction threshold and light loss.
