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Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV

Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies IV March 14-15, 1985, Santa Clara, California - Proceedings of SPIE--the International Society for Optical Engineering

Paperback (01 Jan 1985)

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Book information

ISBN: 9780892525720
Publisher: SPIE--the International Society for Optical Engineering
Imprint: SPIE--the International Society for Optical Engineering
Pub date:
DEWEY: 621.38152
DEWEY edition: 19
Language: English
Number of pages: 219