Delivery included to the United States

Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III

Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicrometer Lithographies III March 15-16, 1984, Santa Clara, California - Proceedings of SPIE--the International Society for Optical Engineering

Paperback (01 Jan 1984)

Not available for sale

Out of stock

This service is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Book information

ISBN: 9780892525065
Publisher: SPIE--the International Society for Optical Engineering
Imprint: SPIE--the International Society for Optical Engineering
Pub date:
DEWEY: 621.38152
DEWEY edition: 19
Language: English
Number of pages: 136