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Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV

Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV 28 February-1 March 1994, San Jose, California - Proceedings / SPIE--the International Society for Optical Engineering

Paperback (01 Jan 1994)

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Book information

ISBN: 9780819414892
Publisher: SPIE
Imprint: SPIE
Pub date:
DEWEY: 621.381531
DEWEY edition: 20
Language: English
Number of pages: 420
Weight: -1g