Biometrics
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Published 20 Nov 2018
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Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI 11-13 March 1996, Santa Clara, California - Proceedings / SPIE--the International Society for Optical Engineering
Paperback (31 May 1997)
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Book information
| ISBN: | 9780819420992 |
| Publisher: | SPIE |
| Imprint: | SPIE |
| Pub date: | 31 May 1997 |
| DEWEY: | 621.381531 |
| DEWEY edition: | 21 |
| Number of pages: | 412 |
| Weight: | 975g |
| Height: | 279mm |
| Width: | 215mm |
| Spine width: | 25mm |
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