Biometrics
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Published 20 Nov 2018
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Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V 20-21 February 1995, Santa Clara, California - Proceedings / SPIE--the International Society for Optical Engineering
Paperback (31 Dec 1995)
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Book information
| ISBN: | 9780819417855 |
| Publisher: | SPIE |
| Imprint: | SPIE |
| Pub date: | 31 Dec 1995 |
| DEWEY: | 621.381531 |
| DEWEY edition: | 20 |
| Language: | English |
| Number of pages: | 450 |
| Weight: | 1066g |
| Height: | 279mm |
| Width: | 222mm |
| Spine width: | 25mm |
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