Paperback (29 Apr 2007) | German
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The question of the interrelationship between diffusion and stress is almost as old as the investigation of diffusion itself. Nowadays, the study of various diffusion and solid-state reaction processes in thin films and multilayers is a vital area of research activity in which, inevitably, diffusion-induced or thermal stresses are of primary importance.Volume is indexed by Thomson Reuters CPCI-S (WoS).
| ISBN: | 9783908451419 |
| Publisher: | Trans Tech Publications Ltd |
| Imprint: | Trans Tech Publications |
| Pub date: | 29 Apr 2007 |
| Language: | German |
| Number of pages: | 186 |
| Weight: | 344g |
| Height: | 234mm |
| Width: | 165mm |
| Spine width: | 6mm |
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