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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications - Materials Science and Process Technology Series

Hardback (01 Feb 1992)

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Publisher's Synopsis

This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

Book information

ISBN: 9780815512882
Publisher: Elsevier Science
Imprint: William Andrew
Pub date:
DEWEY: 621.395
DEWEY edition: 20
Language: English
Number of pages: 235
Weight: 470g
Height: 234mm
Width: 156mm
Spine width: 15mm