Delivery included to the United States

Advanced Gate Stack, Source/drain and Channel Engineering for Si-Based CMOS

Advanced Gate Stack, Source/drain and Channel Engineering for Si-Based CMOS New Materials, Processes, and Equipment : Proceedings of the International Symposium - Proceedings / Electrochemical Socieity

Hardback (01 Jan 2005)

Not available for sale

Out of stock

This service is protected by reCAPTCHA and the Google Privacy Policy and Terms of Service apply.

Book information

ISBN: 9781566774635
Publisher: Electrochemical Society
Imprint: Electrochemical Society
Pub date:
DEWEY: 621.3815
DEWEY edition: 22
Language: English
Number of pages: 634
Weight: 907g
Height: 228mm
Width: 152mm
Spine width: 31mm