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Advanced Etch Technology for Nanopatterning VII

Advanced Etch Technology for Nanopatterning VII 26-28 February 2018, San Jose, California, United States - Proceedings of SPIE

Paperback (30 Jun 2018)

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Publisher's Synopsis

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Book information

ISBN: 9781510616707
Publisher: SPIE
Imprint: SPIE
Pub date:
DEWEY: 621.381531
DEWEY edition: 23
Language: English
Number of pages: 164
Weight: -1g
Height: 279mm
Width: 216mm