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2003 8th International Symposium on Plasma- And Process-Induced Damage

2003 8th International Symposium on Plasma- And Process-Induced Damage April 24-25, 2003, Corbeil-Essonnes, France

Hardback (30 Jun 2003)

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Publisher's Synopsis

This text covers topics including; damage mechanism and modelling; antenna effect and process monitoring; high-K gate dielectric; and integration.

Book information

ISBN: 9780780377479
Publisher: IEEE
Imprint: IEEE
Pub date:
DEWEY: 621.38152
DEWEY edition: 22
Language: English
Number of pages: 189
Weight: -1g