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19th Annual Symposium on Photomask Technology

19th Annual Symposium on Photomask Technology 15-17 September 1999, Monterey, California - SPIE Proceedings Series

Paperback (31 Dec 1999)

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    Publisher's Synopsis

    These 100 papers, presented at the 19th Annual BACUS Symposium on Photomask Technology and Management, offer information on advances in all areas of the field.

    Book information

    ISBN: 9780819434685
    Publisher: SPIE
    Imprint: SPIE
    Pub date:
    DEWEY: 621.381531
    DEWEY edition: 21
    Language: English
    Number of pages: 1022
    Weight: 2426g
    Height: 266mm
    Width: 203mm
    Spine width: 57mm

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